tcct etch
Abstract – The effect of the transformer-coupled capacitive tuning (TCCT) parameter on the etch rate uniformity (ERU) in a high density plasma etch chamber ... ,Abstract – The effect of the transformer-coupled capacitive tuning (TCCT) parameter on the etch rate uniformity (ERU) in a high density plasma etch chamber ...
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 tcct etch 相關參考資料
New metrology for tuning the etch rate uniformity in plasma etch ...
For various typical etch chemistries and different settings of the TCCT parameter, the RF signals recorded by the PVx2 sensor wafers were ... https://www.nanowerk.com Study on Metrology of ERU Tuning in TCP Reactor ... - YMS Magazine
Abstract – The effect of the transformer-coupled capacitive tuning (TCCT) parameter on the etch rate uniformity (ERU) in a high density plasma etch chamber ... https://www.ymsmagazine.com Study on metrology of ERU tuning in TCP reactor, using ... - IEEE Xplore
Abstract – The effect of the transformer-coupled capacitive tuning (TCCT) parameter on the etch rate uniformity (ERU) in a high density plasma etch chamber ... https://ieeexplore.ieee.org Study on metrology of ERU tuning in TCP reactor, using PV×2 sensor ...
The effect of the transformer-coupled capacitive tuning (TCCT) parameter on the etch rate uniformity (ERU) in a high density plasma etch chamber was studied ... https://www.researchgate.net Temperature and RF Current Sensor Wafers for Plasma Etching ...
Temperature and RF Current Sensor Wafers for Plasma Etching ... Improving the Etching Performance of High-Aspect-Ratio Contacts by Wafer ..... The effect of the transformer-coupled capacitive tuning (... https://www.researchgate.net US Patent for Transformer coupled capacitive tuning circuit with fast ...
A transformer coupled capacitive tuning (TCCT) circuit for an ... tuning circuit with fast impedance switching for plasma etch chambers. Jan 11 ... https://patents.justia.com US20130135058A1 - Tcct match circuit for plasma etch chambers ...
31, 2012, and entitled “TCCT Match Circuit for Plasma Etch Chambers.” This application claims priority as a Continuation-in-Part of U.S. patent application Ser. https://patents.google.com US9059678B2 - TCCT match circuit for plasma etch chambers ...
31, 2012, and entitled “TCCT Match Circuit for Plasma Etch Chambers.” This application claims priority as a Continuation-in-Part of U.S. patent application Ser. https://patents.google.com 電漿蝕刻| Conductor Etch. Dielectric Etch. TSV Etch | Lam Research ...
Lam's market-leading plasma etch products are used to carve and shape the intricate features of a device, often requiring atomic-scale precision. Applications ... https://taiwan.lamresearch.com |