waferless auto clean
Improved control of chamber condition through new Waferless. Auto Clean. Sauabh Ullal, Shibu Gangadharan, Erik Edelberg, John Daugherty,. Harmeet Singh ... , 何謂WAC (Waferless Auto Clean). 答：無wafer自動干蝕刻清機. 何謂Dry Clean. 答：干蝕刻清機. 日常測機量測etch rate之目的何在? 答：因為要蝕刻 ...
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 waferless auto clean 相關參考資料
KIYO系列產品- Lam Research
... 透過原位(in-situ)蝕刻功能、連續電漿、以及先進的無晶圓自動清洗(Waferless Auto-Clean)技術，可實現高生產力、低缺陷率的多薄膜堆疊; 採用可修正輸入圖案變異 ... https://www.lamresearch.com Improved control of chamber condition through new Waferless ...
Improved control of chamber condition through new Waferless. Auto Clean. Sauabh Ullal, Shibu Gangadharan, Erik Edelberg, John Daugherty,. Harmeet Singh ... https://nccavs-usergroups.avs. ETCH知識100問，你能答對幾個？ - 每日頭條
何謂WAC (Waferless Auto Clean). 答：無wafer自動干蝕刻清機. 何謂Dry Clean. 答：干蝕刻清機. 日常測機量測etch rate之目的何在? 答：因為要蝕刻 ... https://kknews.cc Waferless clean process of a dry etcher - Lam Research Co ...
The present invention relates to a waferless clean process and, more particularly to a waferless automatic clean process for cleaning a reaction ... http://www.freepatentsonline.c WAFER-LESS AUTO CLEAN OF PROCESSING CHAMBER ...
A method for cleaning a processing chamber, for example, a strip chamber, configured for processing a wafer is provided which includes the ... http://www.freepatentsonline.c WAFERLESS CLEAN IN DIELECTRIC ETCH PROCESS ...
Broadly speaking, the present invention fills these needs by an improved waferless auto clean process. It should be appreciated that the ... http://www.freepatentsonline.c US6325948B1 - Waferless clean process of a dry etcher ...
The present invention relates to a waferless clean process and, more particularly to a waferless automatic clean process for cleaning a reaction chamber of dry ... https://patents.google.com CN1691276A - Waferless automatic cleaning after barrier removal ...
Waferless auto clean to the etch chamber comprising oxygen and nitrogen, providing a waferless auto clean gas, and cleaning gas is formed from the ... https://patents.google.com US7211518B2 - Waferless automatic cleaning after barrier ...
A waferless automatic cleaning of the etch chamber without the wafer is provided. The waferless automatic cleaning comprises providing a waferless automatic ... https://www.google.com 超級結溝槽刻蝕對擊穿電壓均勻性的改善- 雪花新聞
由於溝槽刻蝕工藝時間長在經過長時間刻蝕後腔體內的氛圍會發生改變，溝槽刻蝕率會發生下降，我們通過WAC（waferless auto clean）方式將刻蝕 ... https://www.xuehua.us |