scatterometry critical dimension
由 M Wurm 著作 · 2010 · 被引用 47 次 — The concept of the system is very variable and versatile, so that many different types of measurements, e.g., classical scatterometry, ellipsometric ... ,Request PDF | Evaluation of scatterometry tools for critical dimension metrology | Scatterometry as a non-imaging metrology method offers access to the ...
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 scatterometry critical dimension 相關參考資料
A new flexible scatterometer for critical dimension ... - PubMed
由 M Wurm 著作 · 2010 · 被引用 47 次 — At Physikalisch-Technische Bundesanstalt, the National Metrology Institute of Germany, a new type of deep ultraviolet scatterometer has been developed and ... https://pubmed.ncbi.nlm.nih.go A new flexible scatterometer for critical dimension metrology
由 M Wurm 著作 · 2010 · 被引用 47 次 — The concept of the system is very variable and versatile, so that many different types of measurements, e.g., classical scatterometry, ellipsometric ... https://aip.scitation.org Evaluation of scatterometry tools for critical dimension metrology
Request PDF | Evaluation of scatterometry tools for critical dimension metrology | Scatterometry as a non-imaging metrology method offers access to the ... https://www.researchgate.net Modeling and Analysis of Scatterometry Signatures for Optical ...
由 HJ Patrick 著作 · 被引用 5 次 — We use an optical critical dimension (OCD) technique, matching modeled to measured scatterometry signatures, to obtain critical dimension linewidth of lines ... https://tsapps.nist.gov OCD Metrology for Advanced Lithography - NIST
2017年3月22日 — CD Metrology for Advanced Lithography. 22.03.2017. Critical Dimension CD: structure widths / size. ⇒ OCD (Scatterometry) and extensions. https://www.nist.gov Optical Scatterometry - Optical Critical ... - Nova
Even though these sizes are much smaller than the wavelength of the light that is used, optical scatterometry with sophisticated methods enable to cover this ... https://www.novami.com Scatterometry measurement for gate ADI and AEI critical ...
由 YH Huang 著作 · 2011 · 被引用 6 次 — For these structures, the critical measurement parameters include side wall angle (SWA) and critical dimension (CD). For production process ... https://www.spiedigitallibrary Simulation of critical dimension and profile metrology based ...
由 R Chalykh 著作 · 2006 · 被引用 7 次 — Scatterometry provides fast and nondestructive method of profile and CD measurements. In this paper the conditions of determining of profile and CD measurement ... https://www.spiedigitallibrary |