Tool induced shift
Modern targets exploit dimensional redundancy. TIS (Tool Induced Shift) can be measured by comparing readings to 180 degree rotation. WIS (Wafer induced Shift) ... ,由 ZF Gan 著作 · 2022 — TIS (Tool Induced Shift) and WIS (Wafer Induced Shift) are the main issues for IBO (Image Based Overlay). Many factors could induce measured offset such as ...
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 Tool induced shift 相關參考資料
Machine learning for Tool Induced Shift (TIS) reduction
由 B Ophir 著作 · 2021 · 被引用 5 次 — Tool Induced Shift (TIS) is a measurement error commonly used to measure the accuracy of metrology tools. TIS manifests in the difference in overlay (OVL) ... https://ui.adsabs.harvard.edu Sensors and Metrology - 2 Optical Microscopy and Overlay ...
Modern targets exploit dimensional redundancy. TIS (Tool Induced Shift) can be measured by comparing readings to 180 degree rotation. WIS (Wafer induced Shift) ... https://inst.eecs.berkeley.edu Study and Improvement on Measurement Accuracy of ...
由 ZF Gan 著作 · 2022 — TIS (Tool Induced Shift) and WIS (Wafer Induced Shift) are the main issues for IBO (Image Based Overlay). Many factors could induce measured offset such as ... https://ieeexplore.ieee.org Tool induced shift reduction determination for overlay ...
Tool induced shift (TIS) is a measurement error arising from imperfections in the optical measuring tool. TIS can be caused, for example, when light from a ... https://patents.google.com 疊對量測不確定度評估 - AOIEA
作所造成的不確定度影響(Wafer Induced Shift-WIS)、不同量測機台的誤差(Tool Matching) ... (Tool Induce Shift)，WIS(Wafer Induce. Shift)，參考量測系統(Reference ... https://aoiea.itri.org.tw |