Critical dimension resolution
由 S Kim 著作 · 2018 · 被引用 2 次 — The purpose of measuring critical dimensions is to confirm whether patterns are made as intended. The deposition process for an organic light emitting diode ( ... ,2017年8月5日 — For a focusing objective or for lithography applications, the smallest resolvable distance or the so-called critical dimension/size, ...
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 Critical dimension resolution 相關參考資料
4. CD-SEM - What is a Critical Dimension SEM? - Hitachi High ...
A Critical Dimension SEM (CD-SEM: Critical Dimension Scanning Electron Microscope) is a dedicated system for measuring the dimensions of the fine patterns ... https://www.hitachi-hightech.c A Method for Improving Resolution and Critical Dimension ...
由 S Kim 著作 · 2018 · 被引用 2 次 — The purpose of measuring critical dimensions is to confirm whether patterns are made as intended. The deposition process for an organic light emitting diode ( ... https://www.osapublishing.org Any differences between critical dimensionsize and resolution ...
2017年8月5日 — For a focusing objective or for lithography applications, the smallest resolvable distance or the so-called critical dimension/size, ... https://physics.stackexchange. Glossary of Lithography Terms - C - Chris Mack, Gentleman ...
Critical Dimension (CD) The size (width) of a feature printed in resist, measured at a specific height above the substrate. Also called the linewidth or feature ... http://www.lithoguru.com Lecture57.pdf - Chris Mack, Gentleman Scientist
There are two distinct resolutions in optical lithography. – The smallest pitch. (and half-pitch). – The smallest feature. (critical dimension, CD). http://www.lithoguru.com Photolithography - Wikipedia
Photolithography, also called optical lithography or UV lithography, is a process used in ... is the minimum feature size (also called the critical dimension, ... https://en.wikipedia.org Resolution and components of critical dimension variation in x ...
由 K Early 著作 · 1995 · 被引用 1 次 — We use regression analysis to separate the component of CD variation that is assignable to intrafield form that assignable to interfield. The regression ... https://www.spiedigitallibrary Super-resolution critical dimension limits ... - SPIE Digital Library
由 DB Miller 著作 · 2018 · 被引用 1 次 — Applying a technique borrowed from super-resolution microscopy to photolithography, we achieve critical dimensions well below the ... https://www.spiedigitallibrary |