focus exposure matrix
由 Y Zhang 著作 · 2006 · 被引用 20 次 — In this paper, we introduce a new Focus Exposure Matrix (FEM) model based on Brion's Tachyon platform. The FEM model has two adjustable parameters: focus ... ,由 CA Mack 著作 · 被引用 13 次 — Figure 2 shows typical examples of the output of a focus-exposure matrix using linewidth, sidewall angle, and resist loss as the responses. The most common of.
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 focus exposure matrix 相關參考資料
3.2.1 Focus Effects and Process Window - iue.tuwien.ac.at
The effect of focus on a projection lithography system is a critical part in ... The focus-exposure matrix obtained this way can easily be visualized by a ... https://www.iue.tuwien.ac.at A focus exposure matrix model for full chip lithography ...
由 Y Zhang 著作 · 2006 · 被引用 20 次 — In this paper, we introduce a new Focus Exposure Matrix (FEM) model based on Brion's Tachyon platform. The FEM model has two adjustable parameters: focus ... https://www.spiedigitallibrary Depth of Focus
由 CA Mack 著作 · 被引用 13 次 — Figure 2 shows typical examples of the output of a focus-exposure matrix using linewidth, sidewall angle, and resist loss as the responses. The most common of. http://www.lithoguru.com Glossary of Lithography Terms - F - Chris Mack, Gentleman ...
Focus-Exposure Matrix The variation of linewidth (and possibly other parameters) as a function of both focus and exposure energy. The data are typically plotted ... http://www.lithoguru.com Improved Model for Focus-Exposure Data Analysis
由 CA Mack 著作 · 2003 · 被引用 36 次 — The paper introduces an improved, physics-based function for fitting lithographic data from focus- exposure matrices. Unlike simple polynomial functions, ... http://www.lithoguru.com New approach to the focus exposure matrix (FEM) sample ...
由 H Morokuma 著作 · 2000 · 被引用 3 次 — Besides feature size control of advanced semiconductor device manufacturing, critical dimension (CD) measurement SEMs are also indispensable tools for the ... https://www.spiedigitallibrary Photoresist focus exposure matrix (FEM ... - NASAADS
由 A Meyyappan 著作 · 1998 · 被引用 3 次 — Focus exposure matrices (FEMs) are a critical tool for evaluating the performance of lithographic processes. Any change in any process component, ... https://ui.adsabs.harvard.edu Photoresist focus exposure matrix (FEM) measurements using ...
https://www.spiedigitallibrary 【光刻百科】焦距能量矩陣Focus Energy Matrix (FEM)
2018年10月11日 — 焦距能量矩陣(Focus EnergyMatrix, FEM)是在曝光時，在一個方向以固定的步長改變聚焦值， ... 【光刻百科】曝光後烘烤Post Exposure Bake (PEB). https://www.gushiciku.cn |