dpn process

在DPN HD (高純度解耦電漿氮化) 氮化過程中,用低能量脈衝式電漿將氮注入氧化矽介電質,在閘極堆疊的氮氧化物/多晶矽介面產生所需要的高氮濃度,並維持在矽/ ... , The DPN* system delivers a ro...

dpn process

在DPN HD (高純度解耦電漿氮化) 氮化過程中,用低能量脈衝式電漿將氮注入氧化矽介電質,在閘極堆疊的氮氧化物/多晶矽介面產生所需要的高氮濃度,並維持在矽/ ... , The DPN* system delivers a robust integrated plasma nitridation and anneal process sequence that, for logic devices, allows equivalent oxide ...

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dpn process 相關參考資料
Applied Materials Launches Innovative Nitridation Technology ...

https://www.businesswire.com

Centura® DPN HD 高純度解耦電漿氮化閘極堆疊| Applied ...

在DPN HD (高純度解耦電漿氮化) 氮化過程中,用低能量脈衝式電漿將氮注入氧化矽介電質,在閘極堆疊的氮氧化物/多晶矽介面產生所需要的高氮濃度,並維持在矽/ ...

http://www.appliedmaterials.co

Applied Materials' New DPN System Clears the Path to 65nm ...

The DPN* system delivers a robust integrated plasma nitridation and anneal process sequence that, for logic devices, allows equivalent oxide ...

http://www.appliedmaterials.co

國立交通大學機構典藏- 交通大學

For DPN process, the most important process parameter is the concentration of ... 以DPN 技術來製造的電漿氮化閘極介電層(plasma nitrided gate dielectric)為 ...

https://ir.nctu.edu.tw

Decoupled Plasma Nitridation of Ultrathin Gate Oxides for 65 ...

a decoupled plasma nitridation technique (DPN). This. process allows incorporating a large dose of nitrogen at. the silica top surface leading to thinner equivalent oxide. thickness (EOT), reduced gat...

https://www.electrochem.org

在PDA 和DPN氮化製程下28奈米HKMG pMOSFETs元件之電 ...

... 以及使用含氮化去耦合電漿(DPN)製程和沉積後高溫退火製程元件(PDA),應用在HZH的退火中,探討此等HK/MG pMOSFETs 元件電特性,並比較 ...

https://ndltd.ncl.edu.tw

plasma nitridation optimization for sub-15 gate dielectrics

The DPN gate stack process consists of three steps: growth of a high quality oxide, plasma nitridation and a high temperature anneal. Sub-100 nm n- and p-MOS ...

https://pdfs.semanticscholar.o

(PDF) Plasma nitridation of very thin gate dielectrics

DPN process conditions used. The normalized peak transconductance of RPN and DPN-nitrided gate dielectrics depends on. the detailed ...

https://www.researchgate.net

Trend of subthreshold swing with DPN process ... - IEEE Xplore

Although decoupled plasma nitridation (DPN) post high-k dielectric deposition shows the better threshold voltage shift than post deposition anneal (PDA), t.

https://ieeexplore.ieee.org