Sputter etching
Sputter etching is essentially RIE without reactive ions. The systems used are very similar in principle to sputtering deposition systems. The big difference is ... ,The etch rates that are achievable using physical sputtering are quite low when compared with chemical methods such as plasma etch and RIE. Ion milling is a ...
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 Sputter etching 相關參考資料
Dry etching and sputtering
由 CDW Wilkinson 著作 · 2004 · 被引用 53 次 — Dry etching is an important process for micro- and nanofabrication. Sputtering effects can arise in two contexts within a dry-etch process. https://pubmed.ncbi.nlm.nih.go Etching Processes
Sputter etching is essentially RIE without reactive ions. The systems used are very similar in principle to sputtering deposition systems. The big difference is ... https://www.mems-exchange.org Physical Sputtering and Ion Milling
The etch rates that are achievable using physical sputtering are quite low when compared with chemical methods such as plasma etch and RIE. Ion milling is a ... https://www.mks.com Spectral artefacts post sputter-etching and how to cope ...
由 E Lewin 著作 · 2018 · 被引用 33 次 — The issue of artefacts due to sputter-etching has been investigated for a group of AlN-based thin film materials with varying thermodynamical stability. https://www.sciencedirect.com Sputter etching - The Royal Society of Chemistry
https://www.rsc.org Sputter-etching treatment of proton-exchange membranes
由 T Hrbek 著作 · 2020 · 被引用 16 次 — The approach is based on utilizing magnetron sputtering. The novelty of our patented method is in the simultaneous plasma etching of a PEM and deposition of a ..... https://www.sciencedirect.com Sputtering
Sputtering is etching by means of ionbombardment. The plasma system for this process is designed as a sputter etcher. In this mode, a working electrode is ... https://www.plasma.com 技術與能力
... (Sputter Etching) (2) 離子束蝕刻(Ion Beam Etching) 二、 化學性蝕刻：電漿蝕刻(Plasma Etching) 三、 物理、化學複合蝕刻：反應性離子蝕刻(Reactive Ion Etching 簡稱RIE) ... https://www.uvat.com |