Silicon dry etch gas
For silicon and silicon compounds fluorine and chlorine gases are used primarily. 4. Overview of gases used in dry etching. An etch process is not limited to ... ,Fluorine-containing molecules such as CF4, SF6, NF3, and CHF3 are normally employed for plasma-based dry etching of silicon dioxide. Other gases such as O2 ...
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 Silicon dry etch gas 相關參考資料
Anisotrapic Reactive Ion Etching of Silicon Using SF6O2 ...
由 R Legtenberg 著作 · 1995 · 被引用 269 次 — Dry anisotropic etching of silicon has been achieved with. C1 and Br containing gas mixtures like SF6-CBrF3, i SF6-. C2C13F3, 2 and SF6-C2CIF~. 3.4 Also et... https://research.utwente.nl Dry etch processes - Dryetching - Semiconductor ...
For silicon and silicon compounds fluorine and chlorine gases are used primarily. 4. Overview of gases used in dry etching. An etch process is not limited to ... https://www.halbleiter.org Dry Etching - an overview
Fluorine-containing molecules such as CF4, SF6, NF3, and CHF3 are normally employed for plasma-based dry etching of silicon dioxide. Other gases such as O2 ... https://www.sciencedirect.com Dry Etching of Silicon Materials in SF 6 Based Plasmas
由 Y Tzeng 著作 · 1987 · 被引用 45 次 — Dry etching of silicon using a radio frequency glow discharge in and gas mixtures have been studied. Both and additives can significantly enhance the ... https://iopscience.iop.org Important gases for Si trench etching with their main ...
Defect generation and recovery at the interface of a silicon dioxide/silicon (SiO2/Si) stack are studied in oxygen (O2) or argon (Ar) plasma processing and post ... https://www.researchgate.net Lecture 7 Dry Etching Techniques
Chlorine and Bromine atoms are used in RIE for anisotropic etching of silicon, because these gases can not etch silicon at room temperature without the ... https://fangang.site.nthu.edu. Plasma etchingGases
Active gases · Fluorine species. SF6, CF4, CHF3, C4F Used mainly for etching silicon based materials and a few metals · Chlorine and bromine species. Cl2, BCl3, ... https://lnf-wiki.eecs.umich.ed Silicon dry etching using fluorine-based gas for nanoscale ...
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