Photoresist hardening

由 B Li 著作 · 2017 · 被引用 13 次 — The CVD graphene was transferred following polymer assisted method and shaped by ion-mi...

Photoresist hardening

由 B Li 著作 · 2017 · 被引用 13 次 — The CVD graphene was transferred following polymer assisted method and shaped by ion-milling rather than conventional oxygen plasma etching. A deep UV hardening ... ,For dry etching or electro- plating, in which vertical resist sidewalls must also remain vertical, a thermally more stable photoresist, such as the AZ® 701 MiR ...

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Photoresist hardening 相關參考資料
(PDF) Deep UV hardening of photoresist for shaping of ...

2017年3月10日 — Deep UV hardening of photoresist for shaping of graphene and lift-off fabrication of back-gated field effect biosensors by ion-milling and ...

https://www.researchgate.net

Deep UV hardening of photoresist for shaping of graphene ...

由 B Li 著作 · 2017 · 被引用 13 次 — The CVD graphene was transferred following polymer assisted method and shaped by ion-milling rather than conventional oxygen plasma etching. A deep UV hardening ...

https://www.sciencedirect.com

Hardbake, reflow and DUV Hardening - MicroChemicals

For dry etching or electro- plating, in which vertical resist sidewalls must also remain vertical, a thermally more stable photoresist, such as the AZ® 701 MiR ...

https://www.microchemicals.com

Hardening of photoresist - 한국과학기술정보연구원

Photoresist is hardened by exposing it to UV radiation while subjecting it to elevated temperatures upon an increase in the degree of polymerization due to ...

https://scienceon.kisti.re.kr

Method for plasma hardening photoresist in etching of ...

A plasma photoresist hardening technique is provided to improve the etch resistance of a photoresist mask 26. The technique involves the formation of a thin ...

https://scienceon.kisti.re.kr

Novel hardening methods of DUV chemically amplified ...

由 JS Chun 著作 · 1999 · 被引用 7 次 — Among various ion species, it is found that Argon ion did not affect the photoresist thickness and critical dimension after ion implantation. Much improved ...

https://www.spiedigitallibrary

Novel UV baking process to improve DUV photoresist hardness

由 CS Huang 著作 · 1999 · 被引用 29 次 — ... and footing during UV-bake DUV photoresist hardening process has been developed. After this UV baking process, a higher etch selectivity to photoresist, ...

https://scholar.nycu.edu.tw

Photoresist - Wikipedia

A photoresist is a light-sensitive material used in several processes, such as photolithography and photoengraving, to form a patterned coating on a surface ...

https://en.wikipedia.org

US4548688A - Hardening of photoresist - Google Patents

Photoresist is hardened by exposing it to UV radiation while subjecting it to elevated temperatures upon an increase in the degree of polymerization due to ...

https://patents.google.com

US6660646B1 - Method for plasma hardening photoresist in ...

A plasma photoresist hardening technique is provided to improve the etch resistance of a photoresist mask 26 . The technique involves the formation of a ...

https://patents.google.com