Mask Critical dimension
由 A Sagiv 著作 · 2008 · 被引用 16 次 — Nevertheless, multiple physical variations of the mask parameters can lead to the same aerial CD error. We introduce IntenCDTM, a novel, fast ... ,由 AKK Wong 著作 · 1998 · 被引用 106 次 — Consequences of mask CD error amplification include tightening of mask specification, design grid reduction, shift in optimal mask bias and enhanced defect ...
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 Mask Critical dimension 相關參考資料
(PDF) Mask critical dimension error on optical lithography
Optical lithography at resolution limit is a non-linear pattern transfer. One of the important issue is a mask critical dimension control because of ... https://www.researchgate.net IntenCD: mask critical dimension variation mapping - SPIE ...
由 A Sagiv 著作 · 2008 · 被引用 16 次 — Nevertheless, multiple physical variations of the mask parameters can lead to the same aerial CD error. We introduce IntenCDTM, a novel, fast ... https://www.spiedigitallibrary Lithographic effects of mask critical dimension error - SPIE ...
由 AKK Wong 著作 · 1998 · 被引用 106 次 — Consequences of mask CD error amplification include tightening of mask specification, design grid reduction, shift in optimal mask bias and enhanced defect ... https://www.spiedigitallibrary Long-term critical dimension measurement performance for a ...
由 Z Wang 著作 · 2007 · 被引用 10 次 — The S-9380M is a mask CD-SEM (Critical Dimension Scanning Electron Microscope) system developed for measurement and inspection of 45 nm node photomask. https://www.spiedigitallibrary Mask critical dimension error on optical lithography - SPIE ...
由 TS Eom 著作 · 2000 · 被引用 2 次 — Optical lithography at resolution limit is a non-linear pattern transfer. One of the important issue is a mask critical dimension control because of ... https://www.spiedigitallibrary Specifying and Measuring Photomask Critical Dimensions
由 CA Mack 著作 · 被引用 4 次 — The SIA Roadmap shows that the required mask critical dimension (CD) uniformity scales linearly with the minimum feature size. Thus, each generation of ... http://www.lithoguru.com The impact of mask errors on the critical dimensions of butting ...
由 F Zhang 著作 · 2005 · 被引用 6 次 — All mask errors can magnify the resist CD error and result in the FE windows shrinking. The relations of exposure dose and gap width according to butting ... https://www.spiedigitallibrary What does Critical Dimension mean? - Compugraphics
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